Static Induction Thyristor (Sith)
Static Induction Thyristor (Sith)
Fig. 1
Fig. 2
Features
Since they are normally on-state, gate electrodes must be negatively biased to hold off-state. The SI-thyristor at on-state behaves similar to pin diodes. The on-state voltage is low in the Si-thyristor, which is due to thyristor action followed by carrier injection effect around the gate channel. Minority-carrier device (a JFET structure with an additional injecting layer). Power-handling capability similar to GTO. Faster switching speeds than GTO. Level-triggered and Voltage-driven (voltage-controlled) devices.
Fabrication
Many interesting works have been done on fabricating different structures of SITH to improve its forward blocking and switching characteristics , such as anode-shorting pattern , shallow-junction pattern and double-gate pattern.
Fig. 4
Basic structural types of SITH had been developed in recent years, such as buried gate, surface gate, recessed gate, double dielectrics gate and buried-gate with diffused source region (DSR buried-gate). It is normally ON state device, i.e if the anode is positive and the gate voltage is zero, the device will behave like a diode and current will flow freely. The forward biasing of the P+ N junction will cause a hole injection into the region N- region and its conductivity will be modulated. When the gate is reversed biased with respect to cathode, a depletion layer will block Anode current. As a results device gets OFF. Evidently it is not a thyristor like structure like trigger into conduction device but somewhat SIT like V-I characteristics with varying Negative gate biase.
WORKING
ON-STATE
When a positive voltage pulse is applied to the gates, the depletion region is filled with carriers and the device becomes on-state. The transition time of the turn-on process is largely dominated by the rate of the carrier injection time. At the turn-on phase the SI-thyristor acts just like as a pin-diode
OFF-STATE
Since SITh is normally ON state, the gate electrodes have to be negatively biased. The negative bias voltage to the gate forms a low-conductive depletion region around the gates and the SI-thyristor holds off-state.
Some examples
Type
4kV/300A
5.5kV/600A /400A
4kV/30A
Package
Outside view
Disadvantages
One of the disadvantages of the SIT is the relatively flat shape of the potential barrier. This leads to slow, diffusion based transport of carriers in the vicinity of the potential barrier.
SPECIFICATIONS
Short channel length Low gate series resistance Low gate source capacitance Small thermal resistance Low noise High audio frequency power capability
The forward blocking voltage of this SITH has been increased to 1600 V from the previous value of 1000 V, The blocking gain increased from 40 to 70,
A high anode blocking voltage VAK and switching speed are necessary parameters for SITH with good performance.
Applications
Due to its high switching speed, high di/dt and dv/dt capabilities, along with a low forward on state voltage (Von), SITH has been used in systems of energy accelerator, current-source inverter and high-frequency power conversion, etc.
References
www.wikipedia.org Present status of SIThy shimizu,sekiya,Iidal NGK insulators Power electronics handbook by M.Rashid Recent development of the SIThy and its applications Evaluation of Modern Power Semiconductor Devices and Future Trends of Converters by Bimal K. Bose, Fellow, ZEEE