found: Electr. reprod./Mattox, D.M. The foundations of vacuum coating technology, c2003:p. 1 ("Vacuum coatings processes use a vacuum (subatmospheric pressure) environment and an atomic or molecular condensable vapor source to deposit thin films and coatings ... The vapor source may be from a solid or liquid surface (physical vapor deposition--PVD), or from a chemical vapor precursor (chemical vapor deposition--CVD). The terms 'physical vapor deposition' and 'chemical vapor deposition' seem to have originated with C.F. Powell, J.H. Oxley, and J.M. Blocher, Jr., in their 1966 book Vapor Deposition to differentiate between the types of vapor sources. The term 'vacuum deposition' is often used instead of PVD, particularly in the older literature ... Vacuum coatings can also be formed by deposition of molten particles in a vacuum, but that process will not be covered here ... the term 'vacuum coating' is used here to refer to both thin films and thick deposits deposited by PVD or CVD in a sub-atmospheric (vacuum) gaseous environment.")